To push forward the capability of electronic inks towards the high definition printing at TRL6, which is required for the industrialisation and emergence of next generation printed electronic systems, ATLASS has been structured to serve its five main objectives with seven dedicated activities also called "Workpackages".

First activity (WP1) “Multifunctional Materials” is dedicated to the objective 1 (O1) of developing and improving multifunctional electronic inks (OSC, dielectric, ferroelectric, interface treatment, UV-curing imprint resin) for prototyping on printing pilot-lines. The development will focus on the engineering of molecules and formulation to enable both excellent electrical performance and printability with preindustrial tools at high definition and over large substrates. Inks are tailored at the molecular scale according to the performance targeted by the specifications of the ATLASS application demonstrations (WP6) and to the feedback from printing results (WP2, WP3). Strong focus is given on the up-scaling capability, the materials stability and batch reproducibility, as well as capability to provide uniform performance on dry layers processed over large scale substrates.

Second activity (WP2) “Multilayer High Resolution Printing with Self Aligned Roll-to-Roll Processfocuses on objectives 2 and 4 (O2, O4) with the optimisation of roll-to-roll (R2R) processes for the printing of high-resolution multilayer structures with high throughput at preindustrial scale (250mm web width). These processes will be specifically engineered in ATLASS for the fabrication of the lower layers of the thin film transistor (Front-end of line). The roll-to-roll nano-imprint process is optimised with a tool supplier, to achieve nanometric resolution on large scale substrates for the critical gate layer. Gravure printing technology is engineered in coordination with material development (WP1) and support of a tool supplier to provide a printable nanoscale dielectric layer. A roll-to-roll self-aligned process with nanometric registration will be up scaled for the patterning of Source and Drain electrodes. All these process developments are supported by the Automated Optical Inspection analysis and electrical characterization (WP4), focusing on defectivity analysis and improvement of yield and throughput.

Third Activity (WP3) “Multilayer High Resolution Sheet-to-Sheet Printing Process” focuses on the optimization of sheet-to-sheet processes for the fine processing of functional materials with high resolution and high registration on pre-industrial tools (objectives 2 and 4). Gravure-printing process are engineered and employed here for the fabrication of the upper layers of the ATLASS thin film transistors (Back-end of line). In coordination with semiconductor chemistry developments carried (WP1), this activity focuses both on the fabrication of high resolution tools (rollers) and on the process optimisation for high resolution gravure printing of semiconductor and its capping interlayer dielectric. It also focuses on suitable integration of the printed semiconductor on top of the Front-End Structure delivered by the second activity (WP2) and on the optimisation of electrical properties in the transistor. Yield and throughput improvement are specifically tackled with the support of the fourth activity (WP4).

Fourth activity (WP4) “Characterisation and In line Control for Circuit and Yield Assessment develops the tools and methodologies for the qualification and yield improvement of the printing process. In ATLASS, electrical characterisation and in-line, non-destructive optical control of the defectivity will be jointly developed for printed electronic circuits fabricated by large-volume roll-to-roll and sheet-to-sheet printing (Objective 3). First we set-up a Defectivity Toolbox, including hardware and software for Automatic Optical Inspection (AOI) on foil for the evaluation of print quality. Design of test structures, design rules specifications and electrical characterisation & modelling of transistors are also carried out to provide the Design Tool-kit required for the fabrication of the circuits for the ATLASS application demonstrators. The correlation of electrical characterisation with optical inspection is to enable the development of a defect-yield correlation library, which is used to achieve optically-assisted improvement of process yield in coordination with second and third activities. Task 4.5 will focus on the upscale of AOI equipment to TRL6 (Objective O4), deploying it on the pilot lines and on improvement of the AOI accuracy towards the nano-scale. Finally task 4.6 will also evaluate the real benefits of the process developed in the project in terms Life cycle analyses, energy cost per part, safety issues.

WP5 “Integration of Subsystems and Prototyping on Pilot line“ pursue the ATLAS2 objective O5 with focus on the design of OTFT circuits (Task 5.1), manufacturing of subsystem (Task 5.2) and lamination and assembly for integration of printed foils (Task 5.3) for the demonstrators needed to create the four ATLAS² application: Smart printed temperature sensor, Printed intelligent label, Printed fast pressure sensor foil, Printed proximity IR sensor. Task 5.4 will also participate at prototyping at the pilot line level also focus with validation of the eco-innovation process (objective O5).

WP6 “Applicative Demonstrations” realizes the system integration of ATLAS² foils processed at TRL6, within the complete demonstrator systems (objective O5), and their final testing in realistic demonstration scenarios.

WP7 “Dissemination, workshop, business and financing plans” will mainly work on dissemination and on constituting and refining the future business plans of ATLAS² industries, with study of targeted costs for expected results, plans for financing and seeking other funding opportunities. It will also take care of Intellectual property and Knowledge management plan.

WP 8 “Management” will address administrative, financial as well as consortium and S&T management of the project to achieve the necessary progress in other WPs and 8 address the exploitation and management, including dissemination.



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